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METROLOGY EQUIPMENT
Conquer Industries strives to provide quality pre-owned
equipment at reasonable prices. Below is a sampling from
our current inventory. Of course, many other types of
equipment are available, please call us to discuss these
systems, or any other equipment needs you may have.
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SELA Sample Prep for Failure Analysis for SEM and TEM (NEW ITEM) |
Call for pricing |
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Tool configuration:
TEM701 - EM2 - TEM/STEM & SEM sample preparation system
MC0382 Long Working Distance 100X Objective
ASO770 300mm Universal Wafer Holder and Navigation Option
ASO760 High Magnification Option (HMO)
ASO440 Maintenance
ASD710 50 Process Side View Kit
ASD780 100 No Stub Process Kit
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ESTEK WIS 600 & 600A (NEW ITEMS) |
CALL FOR PRICE |
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Estek WIS 600, Designed to completely analyze substrates, films and oxides used in the manufacture of semiconductors. Dark and light channel system. Dark channel is used for detecting particles and any light scattering defects. Light channel is useful for detecting non-light scattering defects such as mounds, dimples and non uniformity. Detects specular flaws, including large particles, mounds, dimples, saw marks, grooves, fractures, slip, epi-spikes, small particles on large grained surfaces, particles buried in/under a film. Detection 0.30 µm or .20 µm(optional) on Silicon at 95% capture rate. Verified by NIST Traceable Standards.
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BioRad 5900+ Stripping Hall Profiler (NEW ITEM) |
CALL FOR PRICE |
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An automatic system for measuring carrier concentration
and mobility profiles of Silicon and compound semiconductors
- 12 X 12 mm max sample size
- 20uA to 5mA anodize current
- 0-25.5V/0-127.5V anodize volts
- 100W quartz lamp
- >5nm depth resolution
- .32 Tesla Mag strength
- 1 Mohm/sq max sheet res.
- AC(200Hz)/ DC meas. Mode
- Instruction Manual
- Computer based system
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Plasmos SD 2002 Ellipsometer |
CALL FOR PRICE |
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Can handle up to 8" wafers. System is being offered in AS IS
condition. Contact us for more information.
Function: Optical transparent thin film measurement system;
Purpose: Discrete wavelengths of 632.8nm and 1550nm information limit, several micron (optically transparent) measuring spot diameter, 50 micron;
Facilities: Automatic measurement of refractive index and thickness of a thin layer with possibility for mapping of a substrate. Model evaluation of thickness and refractive index for multi-layer system: maximum number of layers is five;
Typical Application: Determination of optical properties of thin films, dielectrics, semiconductors, metals, high-TC superconductors, siliciumoxide and silicium nitride layer characterization;
Wafer size: 150mm/6";
Wafer Specifications: Clean wafers only, virtually every substrate material;
System Options included:
- Video Monitor Model 0M200A;
- Leica Model KL1500 Electronic Lense Objectives;
- Electrophysics Model AF-850 Microscope Autofocus System;
- AF-850 X and Y window position;
- Control switches for auto focus, next focus, forward, reverse, enter and select.
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UltraPoint 1000 |
CALL FOR PRICE |
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Call for details and additional information.
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Prometrix RS 30 with Loader |
CALL FOR PRICE
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Prometrix Omnimap RS 30 Resistivity mapping system
- Up to 8 in wafers
- Uses for point probes to measure Resistivity on films
- Offers Contour and 3-D mapping as well as trend charts
- Includes wafer cassette loader system
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Prometrix SM200e |
CALL FOR PRICE
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Fully rebuilt with a warranty. Contact us for details.
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UNITRON UNIMET 7187 |
CALL FOR PRICE
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Inverted Metallurgical Microscope
Click HERE for additional information (PDF)
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